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Computational evaluation of critical logical metal layers of pitch 20-24nm and the aberration sensitivity in high NA EUV single patterning
- Source :
- DTCO and Computational Patterning II.
- Publication Year :
- 2023
- Publisher :
- SPIE, 2023.
Details
- Database :
- OpenAIRE
- Journal :
- DTCO and Computational Patterning II
- Accession number :
- edsair.doi...........7386dc0b2eee0e8916c46e4c7ce6cc97
- Full Text :
- https://doi.org/10.1117/12.2658871