The Influence of Magnetron Sputtering Conditions on the Physical Properties of (00l) Oriented Nanostructured ZnO Thin Films

Smooth, transparent and highly oriented nanostructured ZnO films were synthesized by RF‐magnetron sputtering onto Si(100) substrates. A mild‐pressed zinc oxide powder target was used for all depositions. The sputtering parameters were varied in order to obtain structures with good adherence and crystallinity. The depositions were carried out in inert argon atmosphere at four sputtering pressures (0.2 Pa, 0.25 Pa, 0.3 Pa and 0.45 Pa). ZnO films were deposited at 150 °C. The films were characterized from structural (XRD) and morphological (AFM) point of view. The influence of each sputtering parameter on the morphological and structural properties is discussed.