Pulsed electron deposition of fluorine-based precursors for YBa2Cu3O7−x-coated conductors

Pulsed electron deposition (PED), an ablation-based film growth technique similar to pulsed-laser deposition, is a relatively new method for the physical vapour deposition (PVD) of thin films. This paper describes the implementation of PED in a reel-to-reel apparatus for the room-temperature deposition of fluorine-based precursors onto buffered and textured Ni?W tapes (RABiTS). These precursors have been converted into superconducting YBa2Cu3O7?x films with high critical currents. The influence of the PED parameters, the background gas pressure, and the target composition on the resulting material is analysed. Ion-probe measurements are used to monitor the deposition process and aid in the determination of the optimum deposition conditions. Special emphasis is placed on issues related to throughput and reliability. The strengths of the PED approach are discussed together with a careful analysis of the open issues and limiting factors that determine whether this method can be used for the commercial fabrication of coated conductors.