Structural and electrical properties of V2O3 thin films on c-plane Al2O3 fabricated by reactive-HiPIMS and dcMS techniques

Authors :: Einar B. Thorsteinsson
Unnar B. Arnalds
M. T. Sultan
Fridrik Magnus
K. Ignatova
Source :: Journal of Physics D: Applied Physics. 54:425302
Publication Year :: 2021
Publisher :: IOP Publishing, 2021.

Subjects :: Materials science
Acoustics and Ultrasonics
business.industry
Plane (geometry)
Atomic force microscopy
Optoelectronics
High-power impulse magnetron sputtering
Metal–insulator transition
Thin film
Condensed Matter Physics
business
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials

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