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Electrical properties in low temperature range (5K–300K) of Tantalum Oxide dielectric MIM capacitors
- Source :
- Microelectronics Reliability. 45:925-928
- Publication Year :
- 2005
- Publisher :
- Elsevier BV, 2005.
-
Abstract
- Tantalum oxide (Ta 2 O 5 ) is widely used for MIM (Metal-Insulator-Metal) capacitor owing of its high dielectric constant. This work examines current–voltage and capacitance–voltage characteristics in the 5 K–300 K temperature range. Working at low temperature was chosen in order to freeze trapping mechanisms of the MIM capacitor. The curvature of C – V characteristics radically changes from 5 K to 300 K. The capacitance variation under voltage at 50 K and below can be investigated using the Langevin theory. From this model the permanent dipole moment and the number of dipoles have been extracted. From Poole–Frenkel identification curves, activation energy around 0.20 eV and a dielectric constant of 26 were found for positive polarisation. However, conduction mechanisms cannot be reduced to strick Poole–Frenkel modelling.
- Subjects :
- Condensed matter physics
Chemistry
business.industry
Electrical engineering
Activation energy
Dielectric
Atmospheric temperature range
Condensed Matter Physics
Thermal conduction
Capacitance
Atomic and Molecular Physics, and Optics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
law.invention
Capacitor
Dipole
law
Electrical and Electronic Engineering
Safety, Risk, Reliability and Quality
business
High-κ dielectric
Subjects
Details
- ISSN :
- 00262714
- Volume :
- 45
- Database :
- OpenAIRE
- Journal :
- Microelectronics Reliability
- Accession number :
- edsair.doi...........7a868d8f2ed2a543b6654c2dee5279b1