Cite
Rapid-thermal annealing for quantum-well heterostructure device fabrication
MLA
Abhaya K. Datye, et al. “Rapid-Thermal Annealing for Quantum-Well Heterostructure Device Fabrication.” IEEE Transactions on Electron Devices, vol. 39, Jan. 1992, pp. 41–49. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........7c7c28a34c8f81c06abb2826502f0ace&authtype=sso&custid=ns315887.
APA
Abhaya K. Datye, L. R. Dawson, Gregory A. Vawter, I. J. Fritz, David R. Myers, T.J. Drummond, D. S. Simons, J. Comas, Eric D. Jones, Thomas M. Brennan, Thomas E. Zipperian, & B. E. Hammons. (1992). Rapid-thermal annealing for quantum-well heterostructure device fabrication. IEEE Transactions on Electron Devices, 39, 41–49.
Chicago
Abhaya K. Datye, L. R. Dawson, Gregory A. Vawter, I. J. Fritz, David R. Myers, T.J. Drummond, D. S. Simons, et al. 1992. “Rapid-Thermal Annealing for Quantum-Well Heterostructure Device Fabrication.” IEEE Transactions on Electron Devices 39 (January): 41–49. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........7c7c28a34c8f81c06abb2826502f0ace&authtype=sso&custid=ns315887.