Design and study of efficiency of EUV condensor for illumination of large samples

Laser plasma source in WAT, Poland, is used as the source of EUV radiation for lithography and illumination of biological samples. The source has to be equipped with a complementary condensor with the goal of having a higher peak intensity than using current systems and moreover with the ability to illuminate larger areas homogeneously. The work concentrates on the analysis and design process of the optics based on the known source parameters, namely typical spectra, angular and intensity distributions and other constraints. Further, the question of illuminating the samples via multi shot approach by shifting the sample is discussed and estimates on the optimal sample shift in between two shots are explained.