Experimental demonstration of high-gain CMOS inverter operation at low V dd down to 0.5 V consisting of WSe2 n/p FETs

In this paper, we report on the device concepts for high-gain operation of a tungsten diselenide (WSe2) complementary metal-oxide-semiconductor (CMOS) inverter at a low power supply voltage (V dd ), which was realized by developing a doping technique and gate stack technology. A spin-coating with a fluoropolymer and poly(vinyl alcohol) (PVA) results in the doping of both electrons and holes to WSe2. A hybrid self-assembled monolayer/aluminum oxide (AlO x ) gate dielectric is viable for achieving high gate capacitance and superior interfacial properties. By developing the doping technique and gate stack technology, we experimentally realized a high gain of 9 at V dd of 0.5 V in the WSe2 CMOS inverter. This study paves the way for the research and development of transition metal dichalcogenides-based devices and circuits.