Computer‐controlled four‐gun multisubstrate sputtering system for the preparation of composition‐modulated structures

We describe a four‐gun sputtering system which has been used successfully to prepare composition‐modulated structures consisting of amorphous semiconductors and superconducting alloys or binary compounds. The substrates are mounted in ovens which can be individually heated to over 1000 °C. The ovens are mounted on a wheel which is driven by a computer‐controlled stepping motor. With appropriate programming of the movement of the stepping motor, the deposition sequence is determined.