Cite
CMOS compatible alignment marks for the SCALPEL proof of lithography tool
MLA
Reginald C. Farrow, et al. “CMOS Compatible Alignment Marks for the SCALPEL Proof of Lithography Tool.” Microelectronic Engineering, vol. 46, May 1999, pp. 263–66. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........8328244ee8d4005da205219d9fc725ca&authtype=sso&custid=ns315887.
APA
Reginald C. Farrow, Joseph A. Felker, Myrtle I. Blakey, Masis Mkrtchyan, Gregg M. Gallatin, Avinoam Kornblit, Milton L. Peabody, Anthony E. Novembre, Richard J. Kasica, P. A. Orphanos, Isik C. Kizilyalli, J. S. Kraus, C. Biddick, Leonidas E. Ocola, F. Klemens, & Warren K. Waskiewicz. (1999). CMOS compatible alignment marks for the SCALPEL proof of lithography tool. Microelectronic Engineering, 46, 263–266.
Chicago
Reginald C. Farrow, Joseph A. Felker, Myrtle I. Blakey, Masis Mkrtchyan, Gregg M. Gallatin, Avinoam Kornblit, Milton L. Peabody, et al. 1999. “CMOS Compatible Alignment Marks for the SCALPEL Proof of Lithography Tool.” Microelectronic Engineering 46 (May): 263–66. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........8328244ee8d4005da205219d9fc725ca&authtype=sso&custid=ns315887.