Improved Femtosecond 3D Light Field Lithography With a Phase-Controlled Spatial Light Modulator

Through years of development, we have successfully demonstrated 3D light field lithography with UV continuous light. We recently combined this approach with femtosecond laser sources as two-photon femtosecond 3D light lithography. It is found that consistent results can happen under limited conditions with this direct combination. Our theoretical analysis reported last year shows that the experimental difficulty can be attributed to digital micro-mirror devices (DMD) and microlens arrays (MLA) used in the current 3D light field projection. Though they can control the propagation directions and interact at designed 3D locations, rays from such a system diverge with respect to the propagation distance. As a result, 3D voxel intensity in the 3D projection changes as a function of the separation distance with respect to the MLA in the 3D projection. To solve this problem, we replace the combination of DMD and MLA with a phase-controlled spatial light modulator. With a lab-developed algorithm, a single femtosecond laser pulse can generate up to a million sub-rays through the phase-controlled spatial light modulator. These sub-rays with a precisely controlled propagation direction can intersect at designed 3D locations as voxels for 3D virtual object constructions. Moreover, these sub-rays have minimum divergence angles to ensure that the voxel intensities are maintained consistently at each 3D location. We also demonstrated that versatile 3D patterns could be generated with two-photon femtosecond 3D light field lithography based on this innovative approach.