Effect of segment difference of photoresist on lithography pattern and improvement

Authors :: 马小辉 Ma Xiao-hui
李亚文 Li Ya-wen
刘小波 Liu Xiao-bo
张旭 Zhang Xu
张玉虎 Zhang Yu-hu
Source :: Chinese Journal of Liquid Crystals and Displays. 33:653-660
Publication Year :: 2018
Publisher :: Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2018.

Subjects :: Materials science
business.industry
Signal Processing
Optoelectronics
Photoresist
business
Instrumentation
Lithography
Electronic, Optical and Magnetic Materials

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