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Epitaxial growth and characterization of CuCl(110)/GaP(110)

Authors :
Antoine Kahn
W. Chen
S. Ahsan
Charles B. Duke
A. Paton
M. Dumas
Source :
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 10:2071-2076
Publication Year :
1992
Publisher :
American Vacuum Society, 1992.

Abstract

Epitaxial layers of the ionic zinc blende compound CuCl are grown on the (110) surface of GaP. The growth is performed by congruent evaporation from a single CuCl source. Surface and interface properties of CuCl/GaP are studied with Auger electron spectroscopy, ultraviolet and x‐ray photoemission spectroscopy, electron energy‐loss spectroscopy, and low‐energy electron diffraction. The interface formed at 100 °C is abrupt, but undergoes a massive chemical reaction which leads to the formation of a copper phosphide layer at high temperature (≥300 °C). The valence band discontinuity is 0.85 eV ±0.15 at the abrupt CuCl/GaP interface. The CuCl(110) surface is atomically ordered and exhibits a (1×1) unit cell. Its atomic geometry is determined by multiple scattering analysis of low‐energy electron diffraction intensities. The surface is found to be relaxed in a way which is entirely compatible with the ‘‘universal’’ structure of cleavage surfaces of tetrahedrally coordinated III–V and II–VI compound semiconductors.

Details

ISSN :
15208559 and 07342101
Volume :
10
Database :
OpenAIRE
Journal :
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Accession number :
edsair.doi...........83789336960b17c63a0fff1263e5fb29
Full Text :
https://doi.org/10.1116/1.578027