Comparative study of double ion implant Ti salicide and pre-amorphization implant Co salicide for ultra-large-scale integration applications

MLA

Xin Da Liao, et al. “Comparative Study of Double Ion Implant Ti Salicide and Pre-Amorphization Implant Co Salicide for Ultra-Large-Scale Integration Applications.” Semiconductor Science and Technology, vol. 17, Sept. 2002, pp. 1075–80. EBSCOhost, https://doi.org/10.1088/0268-1242/17/10/308.

APA

Xin Da Liao, Chun Tsen Lu, Kong Beng Thei, Sheng Fu Tsai, Kuan Ming Lee, Hung Ming Chuang, & Wen-Chau Liu. (2002). Comparative study of double ion implant Ti salicide and pre-amorphization implant Co salicide for ultra-large-scale integration applications. Semiconductor Science and Technology, 17, 1075–1080. https://doi.org/10.1088/0268-1242/17/10/308

Chicago

Xin Da Liao, Chun Tsen Lu, Kong Beng Thei, Sheng Fu Tsai, Kuan Ming Lee, Hung Ming Chuang, and Wen-Chau Liu. 2002. “Comparative Study of Double Ion Implant Ti Salicide and Pre-Amorphization Implant Co Salicide for Ultra-Large-Scale Integration Applications.” Semiconductor Science and Technology 17 (September): 1075–80. doi:10.1088/0268-1242/17/10/308.