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Metalorganic chemical vapor deposition of lead-free ferroelectric BiFeO3 films for memory applications

Authors :
M. P. Cruz
Q. Zhan
Ramamoorthy Ramesh
Ying-Hao Chu
F. Zavaliche
V. Vaithyanathan
S. Y. Yang
Darrell G. Schlom
Y. J. Lee
L. Mohaddes-Ardabili
T. Zhao
Source :
Applied Physics Letters. 87:102903
Publication Year :
2005
Publisher :
AIP Publishing, 2005.

Abstract

We have grown BiFeO3 thin films on SrRuO3∕SrTiO3 and SrRuO3∕SrTiO3∕Si using liquid delivery metalorganic chemical vapor deposition. Epitaxial BiFeO3 films were successfully prepared through the systematic control of the chemical reaction and deposition process. We found that the film composition and phase equilibrium are sensitive to the Bi:Fe ratio in the precursor. Fe-rich mixtures show the existence of α-Fe2O3, while Bi-rich mixtures show the presence of β-Bi2O3 as a second phase at the surface. In the optimized films, we were able to obtain an epitaxial single perovskite phase thin film. Electrical measurements using both quasistatic hysteresis and pulsed polarization measurements confirm the existence of ferroelectricity with a switched polarization of 110–120μC∕cm2, ΔP(=P*−P). Out-of plane piezoelectric (d33) measurements using an atomic force microscope yield a value of 50–60pm∕V.

Details

ISSN :
10773118 and 00036951
Volume :
87
Database :
OpenAIRE
Journal :
Applied Physics Letters
Accession number :
edsair.doi...........87a9d6cbb0e2bb061382278b083003b2
Full Text :
https://doi.org/10.1063/1.2041830