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Metal−Organic Chemical Vapor Deposition of CeO2 〈100〉 Oriented Films on No-Rolled Hastelloy C276

Metal−Organic Chemical Vapor Deposition of CeO2 〈100〉 Oriented Films on No-Rolled Hastelloy C276

Authors :
Ignazio L. Fragalà
Raffaella Lo Nigro
Graziella Malandrino
Source :
Chemistry of Materials. 13:4402-4404
Publication Year :
2001
Publisher :
American Chemical Society (ACS), 2001.

Abstract

MOCVD has been applied to the first successful deposition of CeO2 〈100〉 oriented films on no-rolled Hastelloy C276. The presently found columnar grain morphologies have been related to the zone model proposed by Mochvan and Demchishin for physical vapor deposition processes. The fiber texture strongly depends on the deposition temperature.

Details

ISSN :
15205002 and 08974756
Volume :
13
Database :
OpenAIRE
Journal :
Chemistry of Materials
Accession number :
edsair.doi...........897f9ed246d9d85d1dde284c0583eb0b
Full Text :
https://doi.org/10.1021/cm011232f