Polycrystalline β-C 3 N 4 Thin Films Deposited on Single-Crystal KCl(100) Using rf Sputtering

The carbon-nitride thin films were deposited on the (100) oriented single-crystal KCl wafers at ambient temperatures by using rf-plasma sputtering. The IR spectrum showed that the films contained carbon-nitride bonds. The transmission electron microscopy (TEM) and x-ray diffraction (XRD) measurements indicated the existence of predicted polycrystalline β-C3N4 films on the KCl(100) wafers. And the TEM and XRD measured lattice spacings well match the calculated data.