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Polycrystalline β-C 3 N 4 Thin Films Deposited on Single-Crystal KCl(100) Using rf Sputtering
- Source :
- Chinese Physics Letters. 13:69-72
- Publication Year :
- 1996
- Publisher :
- IOP Publishing, 1996.
-
Abstract
- The carbon-nitride thin films were deposited on the (100) oriented single-crystal KCl wafers at ambient temperatures by using rf-plasma sputtering. The IR spectrum showed that the films contained carbon-nitride bonds. The transmission electron microscopy (TEM) and x-ray diffraction (XRD) measurements indicated the existence of predicted polycrystalline β-C3N4 films on the KCl(100) wafers. And the TEM and XRD measured lattice spacings well match the calculated data.
Details
- ISSN :
- 17413540 and 0256307X
- Volume :
- 13
- Database :
- OpenAIRE
- Journal :
- Chinese Physics Letters
- Accession number :
- edsair.doi...........8b2fd309a6c45fec5df7d172a1d376a8