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Interface characterization and thermal stability of Co/Al–O/CoFe spin-dependent tunnel junctions
- Source :
- Journal of Applied Physics. 91:7475
- Publication Year :
- 2002
- Publisher :
- AIP Publishing, 2002.
-
Abstract
- A detailed study of the interface properties as well as the thermal stability has been done for the Co/Al–O/CoFe/NiFe magnetic tunnel junction, by using high resolution transmission electron microscopy equipped with energy dispersive x-ray spectrum. The Al behaves more stable against thermal annealing compared with the Fe, Co, Ni, and O elements. The reduction of the tunnel magnetoresistance ratio for the low annealing temperature (200 °C) may be caused by the spin flip scattering at oxide ion, rather than by the change in magnetic properties. The annealing at higher temperatures (300 °C and 400 °C) results in a strong interdiffusion, and in turn the disappearance of the magnetoresistance due to the shortcut of the junction.
- Subjects :
- Condensed Matter::Materials Science
Tunnel magnetoresistance
Materials science
Condensed matter physics
Magnetoresistance
Ferromagnetism
Annealing (metallurgy)
Transmission electron microscopy
General Physics and Astronomy
Coulomb blockade
Thermal stability
Condensed Matter::Mesoscopic Systems and Quantum Hall Effect
High-resolution transmission electron microscopy
Subjects
Details
- ISSN :
- 00218979
- Volume :
- 91
- Database :
- OpenAIRE
- Journal :
- Journal of Applied Physics
- Accession number :
- edsair.doi...........8c7ccb20cea3539a7cdbbd9975b0391f