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IR-drying of photoresists: experimental and theoretical consideration of drying kinetics of mono- and multi-layered coatings

IR-drying of photoresists: experimental and theoretical consideration of drying kinetics of mono- and multi-layered coatings

Authors :
J. Saupe
M. Schönfeld
J. Grimm
S. Schubert
Source :
Microsystem Technologies. 20:1803-1806
Publication Year :
2013
Publisher :
Springer Science and Business Media LLC, 2013.

Abstract

Based on a suitable infrared drying system, experimental considerations of photoresist drying during soft bake have been carried out. A simple mono-parametric model for describing drying kinetics of photo resists, derived from Second Fick?s Law, is presented in this paper. The presented model has been used for curve-fitting on the measurements. The resulting plots showing a good correlation to measurements, especially in the diffusion-dominated drying phases at long drying times. The diffusion coefficients (resulting from curve fits) clearly showing a thermal activated process. Subsequently, experimental considerations of drying of multi-layer systems has been carried out.

Details

ISSN :
14321858 and 09467076
Volume :
20
Database :
OpenAIRE
Journal :
Microsystem Technologies
Accession number :
edsair.doi...........8f0717ea17d485f0486ec89ca6b37ee9
Full Text :
https://doi.org/10.1007/s00542-013-1934-5