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IR-drying of photoresists: experimental and theoretical consideration of drying kinetics of mono- and multi-layered coatings
IR-drying of photoresists: experimental and theoretical consideration of drying kinetics of mono- and multi-layered coatings
- Source :
- Microsystem Technologies. 20:1803-1806
- Publication Year :
- 2013
- Publisher :
- Springer Science and Business Media LLC, 2013.
-
Abstract
- Based on a suitable infrared drying system, experimental considerations of photoresist drying during soft bake have been carried out. A simple mono-parametric model for describing drying kinetics of photo resists, derived from Second Fick?s Law, is presented in this paper. The presented model has been used for curve-fitting on the measurements. The resulting plots showing a good correlation to measurements, especially in the diffusion-dominated drying phases at long drying times. The diffusion coefficients (resulting from curve fits) clearly showing a thermal activated process. Subsequently, experimental considerations of drying of multi-layer systems has been carried out.
Details
- ISSN :
- 14321858 and 09467076
- Volume :
- 20
- Database :
- OpenAIRE
- Journal :
- Microsystem Technologies
- Accession number :
- edsair.doi...........8f0717ea17d485f0486ec89ca6b37ee9
- Full Text :
- https://doi.org/10.1007/s00542-013-1934-5