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Cite

Reduced-pressure chemical vapor deposition of boron-doped Si and Ge layers

MLA

Y. Bogumilowicz, and J.M. Hartmann. “Reduced-Pressure Chemical Vapor Deposition of Boron-Doped Si and Ge Layers.” Thin Solid Films, vol. 557, Apr. 2014, pp. 4–9. EBSCOhost, https://doi.org/10.1016/j.tsf.2013.08.037.



APA

Y. Bogumilowicz, & J.M. Hartmann. (2014). Reduced-pressure chemical vapor deposition of boron-doped Si and Ge layers. Thin Solid Films, 557, 4–9. https://doi.org/10.1016/j.tsf.2013.08.037



Chicago

Y. Bogumilowicz, and J.M. Hartmann. 2014. “Reduced-Pressure Chemical Vapor Deposition of Boron-Doped Si and Ge Layers.” Thin Solid Films 557 (April): 4–9. doi:10.1016/j.tsf.2013.08.037.