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Atomic Layer Deposition of Boron‐Doped Al 2 O 3 Dielectric Films

Authors :
Xinzhi Li
Marko Vehkamäki
Mykhailo Chundak
Kenichiro Mizohata
Anton Vihervaara
Markku Leskelä
Matti Putkonen
Mikko Ritala
Source :
Advanced Materials Interfaces.
Publication Year :
2023
Publisher :
Wiley, 2023.

Subjects

Subjects :
Mechanics of Materials
Mechanical Engineering

Details

ISSN :
21967350
Database :
OpenAIRE
Journal :
Advanced Materials Interfaces
Accession number :
edsair.doi...........952dce91f741940a9ff6e439eda20fcf
Full Text :
https://doi.org/10.1002/admi.202300173
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