Back to Search Start Over

Gate Voltage Pulse Rising Edge Dependent Dynamic Hot Carrier Degradation in Poly-Si Thin-Film Transistors

Authors :
Dongli Zhang
Mingxiang Wang
Lekai Chen
Huaisheng Wang
Source :
IEEE Electron Device Letters. 42:1615-1618
Publication Year :
2021
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 2021.

Abstract

Dynamic degradation becomes a critical issue for thin-film transistors (TFTs) used in emerging new displays driven by high frequency gate voltage ${V}_{\text {G}}$ pulses. In this study, ${V}_{\text {G}}$ pulse rising edge dependent dynamic hot carrier degradation of poly-Si TFTs is investigated. It is demonstrated that rising edge of ${V}_{\text {G}}$ pulses which swing within the OFF-state of TFTs causes the degradation, while that of normal ${V}_{\text {G}}$ pulses which switch between the ON and OFF states across the flat band voltage ${V}_{\text {FB}}$ of TFTs does not. Based on transient TCAD simulation, the underlying mechanism of rising edge dependent degradation is proposed, which is based on the non-equilibrium PN junction degradation model previously proposed to explain ${V}_{\text {G}}$ pulse falling edge dependent degradation of poly-Si TFTs. Hence, the dynamic degradation model of poly-Si TFTs related to both rising and falling edge of the ${V}_{\text {G}}$ pulses can be unified now, which is applicable to fast gate pulses with steep rising and/or falling edges in sub- $\mu \text{s}$ level.

Details

ISSN :
15580563 and 07413106
Volume :
42
Database :
OpenAIRE
Journal :
IEEE Electron Device Letters
Accession number :
edsair.doi...........9634c5519c2a06489086bd6258a3df93
Full Text :
https://doi.org/10.1109/led.2021.3110916