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Pushing the limits of EUV mask repair: addressing sub-10 nm defects with the next generation e-beam-based mask repair tool
- Source :
- Journal of Micro/Nanopatterning, Materials, and Metrology. 20
- Publication Year :
- 2021
- Publisher :
- SPIE-Intl Soc Optical Eng, 2021.
Details
- ISSN :
- 27088340
- Volume :
- 20
- Database :
- OpenAIRE
- Journal :
- Journal of Micro/Nanopatterning, Materials, and Metrology
- Accession number :
- edsair.doi...........97310432bc94a6b47b762f5470e2dddf
- Full Text :
- https://doi.org/10.1117/1.jmm.20.3.031013