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Collisional and chemically guided processes in low energy ion beam oxidation
- Source :
- Vacuum. 43:583-585
- Publication Year :
- 1992
- Publisher :
- Elsevier BV, 1992.
-
Abstract
- It has been shown [Todorov and Fossum, J Vac Sci Technol , B6 , 466 (1988)] that ultra-thin ( d ≈ 50 A) oxide films can be grown on silicon surfaces at reduced substrate temperatures using oxygen-containing low energy ion beams ( E
Details
- ISSN :
- 0042207X
- Volume :
- 43
- Database :
- OpenAIRE
- Journal :
- Vacuum
- Accession number :
- edsair.doi...........982fa8102d86be999cc08590a5170c56
- Full Text :
- https://doi.org/10.1016/0042-207x(92)90081-7