Development of design of 808 nm Al-free laser heterostructures with asymmetric barrier layers

We study the possibility of realization of the asymmetric barrier layers (ABL) concept in an 808-nm Al-free GaInAsP/InGaP/GaAs semiconductor laser. Two ABLs on both sides of the active region are aimed to suppress the parasitic recombination in the optical confinement layers. It is shown that such ABL-laser can be made fully Al-free having high suppression ratios for parasitic charge carrier flows (60 and 207 times for electrons and holes, respectively, as compared to a conventional SCH heterostructure).