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Proximity Effect in Electron-Beam-Induced Deposition
- Source :
- Japanese Journal of Applied Physics. 45:5517-5521
- Publication Year :
- 2006
- Publisher :
- IOP Publishing, 2006.
-
Abstract
- Beam induced deposition is versatile technique to fabricate nano-structure. In this paper, the proximity effect in electron beam induced deposition was studied, and the beam scan sequence which minimizes the effect was suggested.
- Subjects :
- Materials science
Reflection high-energy electron diffraction
Physics and Astronomy (miscellaneous)
Ion beam
Proximity effect (electron beam lithography)
business.industry
technology, industry, and agriculture
General Engineering
Physics::Optics
General Physics and Astronomy
Focused ion beam
Ion beam deposition
Physics::Accelerator Physics
Optoelectronics
Stencil lithography
Atomic physics
Electron beam-induced deposition
business
Beam (structure)
Subjects
Details
- ISSN :
- 13474065 and 00214922
- Volume :
- 45
- Database :
- OpenAIRE
- Journal :
- Japanese Journal of Applied Physics
- Accession number :
- edsair.doi...........9b98b33b5dc92d3d90b4d0d4941a61bc
- Full Text :
- https://doi.org/10.1143/jjap.45.5517