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Effect of Ar/Ar-H2 Plasma Arc Melting on Cu Purification

Authors :
Kouji Mimura
N.R. Munirathnam
Min Seuk Kim
Jae-Won Lim
Minoru Isshiki
Minh Tung Le
Hyuk Chon Kwon
Good Sun Choi
Masahito Uchikoshi
Source :
MATERIALS TRANSACTIONS. 49:1826-1829
Publication Year :
2008
Publisher :
Japan Institute of Metals, 2008.

Abstract

Removal of impurities from Cu metal by Ar and Ar-20%H2 plasma arc melting (PAM) has been carried out. Several impurities such as Li, Na, Mg, P, S, Cl, K, Ca, Zn, Pd, Pb and Bi in Cu were efficiently removed when only Ar plasma gas was used. Moreover, removal degrees for the above mentioned impurities were significantly increased after Ar-20%H2-PAM, especially for K, Zn and Pd. It was found that Ar-H2 PAM showed an excellent effect to eliminate impurities with higher vapor pressures than that of Cu metal. [doi:10.2320/matertrans.MRA2008054]

Details

ISSN :
13475320 and 13459678
Volume :
49
Database :
OpenAIRE
Journal :
MATERIALS TRANSACTIONS
Accession number :
edsair.doi...........9bfd795bcf2a2fb3036b0be7ea7401e2
Full Text :
https://doi.org/10.2320/matertrans.mra2008054