P‐11.9: Study on process conditions of planarization layer in FFS mode using a‐IGZO TFTs

Authors :: Li Zhang
Shu-Jhih Chen
Chunge Yuan
Kai-Jun Wang
Yu Shi
Zhu-Hui Li
Chia-Yu Lee
Qiao Huang
Source :: SID Symposium Digest of Technical Papers. 50:927-929
Publication Year :: 2019
Publisher :: Wiley, 2019.

Subjects :: Materials science
business.industry
Chemical-mechanical planarization
Mode (statistics)
Optoelectronics
business
Silicon oxide
Layer (electronics)
Process conditions

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