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Residual Strain Measurement of SOI Wafer Using Convergent Beam Electron Diffraction

Authors :
T Yamazaki
Iwao Hashimoto
T Isaka
Kazuto Watanabe
K Kuramochi
Source :
Microscopy and Microanalysis. 11
Publication Year :
2005
Publisher :
Oxford University Press (OUP), 2005.

Subjects

Subjects :
Crystallography
Optics
Reflection high-energy electron diffraction
Materials science
Electron diffraction
business.industry
Residual strain
Silicon on insulator
Wafer
Convergent beam
business
Instrumentation

Details

ISSN :
14358115 and 14319276
Volume :
11
Database :
OpenAIRE
Journal :
Microscopy and Microanalysis
Accession number :
edsair.doi...........a00fc826b21f86ebe792009e44058758
Full Text :
https://doi.org/10.1017/s1431927605503416
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