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Understanding amorphous states of phase-change memory using Frenkel-Poole model

Authors :
R. Dasaka
Y.H. Shih
Roger W. Cheek
Eric A. Joseph
Ming-Hsiu Lee
Yu Zhu
A. G. Schrott
Bipin Rajendran
Matthew J. Breitwisch
Chieh-Fang Chen
Jau-Yi Wu
Huai-Yu Cheng
Simone Raoux
C. Lam
Erh-Kun Lai
H.L. Lung
Source :
2009 IEEE International Electron Devices Meeting (IEDM).
Publication Year :
2009
Publisher :
IEEE, 2009.

Abstract

A method based on Frenkel-Poole emission is proposed to model the amorphous state (high resistance state) in mushroom-type phase-change memory devices. The model provides unique insights to probe the device after amorphizing (RESET) operation. Even when the resistance appears the same under different RESET conditions, our model suggests that both the amorphous region size and the defect states are different. With this powerful new tool, detailed changes inside the amorphous GST for MLC operation and retention tests are revealed.

Details

Database :
OpenAIRE
Journal :
2009 IEEE International Electron Devices Meeting (IEDM)
Accession number :
edsair.doi...........a1439e7f1c4711cf2dd8fc082e3022a8
Full Text :
https://doi.org/10.1109/iedm.2009.5424229