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A 64-kbit dynamic MOS RAM

Authors :
E. Arai
N. Ieda
Source :
IEEE Journal of Solid-State Circuits. 13:333-338
Publication Year :
1978
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 1978.

Abstract

A 64-kbit dynamic MOS RAM is developed by using 2 /spl mu/m rule VLSI fabrication technology and low power circuit technology. The 2 /spl mu/m rule VLSI fabrication technology is achieved by improving various aspects of the ultraviolet photolithographic, thin-gate oxidation, arsenic ion implantation, and multilevel interconnection processes. Microminiaturization of the device structure has made the voltage requirements for its MOST threshold voltage and DC supply voltages low. A highly sensitive and low power dissipating sense circuit has been developed for the VLSI RAM. A new level-detecting circuit with a logic threshold which is independent of MOST threshold voltage is proposed. A dynamic address-buffer circuit is also shown. The fabricated 64K RAM has 200 ns of access time, 370 ns of minimum cycle time, and 150 mW of power dissipation under typical supply voltage conditions of V/SUB DD/=7 V and V/SUB BB/=-2 V.

Details

ISSN :
1558173X and 00189200
Volume :
13
Database :
OpenAIRE
Journal :
IEEE Journal of Solid-State Circuits
Accession number :
edsair.doi...........a1ca01a906493694d563eee2750a5c4b
Full Text :
https://doi.org/10.1109/jssc.1978.1051049