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Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
- Source :
- Journal of Applied Physics. 125:013301
- Publication Year :
- 2019
- Publisher :
- AIP Publishing, 2019.
-
Abstract
- Generation of singly charged Ar + and Ti +, doubly charged Ar 2 + and Ti 2 +, and of Ar 2 + and Ti 2 + dimer ions in a high power impulse magnetron sputtering (HiPIMS) discharge with a Ti cathode was investigated. Energy-resolved mass spectrometry was employed. The argon gas pressures varied between 0.5 and 2.0 Pa. Energy spectra of monomer ions are composed of low- and high-energy components. The energetic position of the high-energy component is approximately twice as large for doubly charged ions compared to singly charged ions. Intensities of Ar 2 + and Ti 2 + dimer ions are considerably smaller during HiPIMS compared to dc magnetron sputtering.
- Subjects :
- 010302 applied physics
Materials science
Dimer
Analytical chemistry
General Physics and Astronomy
02 engineering and technology
Sputter deposition
021001 nanoscience & nanotechnology
Mass spectrometry
01 natural sciences
Spectral line
Cathode
Ion
law.invention
chemistry.chemical_compound
Monomer
chemistry
Physics::Plasma Physics
law
0103 physical sciences
High-power impulse magnetron sputtering
0210 nano-technology
Subjects
Details
- ISSN :
- 10897550 and 00218979
- Volume :
- 125
- Database :
- OpenAIRE
- Journal :
- Journal of Applied Physics
- Accession number :
- edsair.doi...........a2cb00ccebeb9c96c2ef4d27b4e2e24b
- Full Text :
- https://doi.org/10.1063/1.5055356