Effect of substrate temperature and deposited thickness on the formation of iron silicide prepared by ion beam sputter deposition

MLA

M. Haraguchi, et al. “Effect of Substrate Temperature and Deposited Thickness on the Formation of Iron Silicide Prepared by Ion Beam Sputter Deposition.” Thin Solid Films, vol. 461, Aug. 2004, pp. 13–16. EBSCOhost, https://doi.org/10.1016/j.tsf.2004.02.051.

APA

M. Haraguchi, K. Yamaguchi, K Shimura, Hiroyuki Yamamoto, Kiichi Hojou, & T Katsumata. (2004). Effect of substrate temperature and deposited thickness on the formation of iron silicide prepared by ion beam sputter deposition. Thin Solid Films, 461, 13–16. https://doi.org/10.1016/j.tsf.2004.02.051

Chicago

M. Haraguchi, K. Yamaguchi, K Shimura, Hiroyuki Yamamoto, Kiichi Hojou, and T Katsumata. 2004. “Effect of Substrate Temperature and Deposited Thickness on the Formation of Iron Silicide Prepared by Ion Beam Sputter Deposition.” Thin Solid Films 461 (August): 13–16. doi:10.1016/j.tsf.2004.02.051.