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Influence of carrier and doping gases on the chemical vapor deposition of silicon quantum dots
- Source :
- Materials Science and Engineering: B. 101:164-168
- Publication Year :
- 2003
- Publisher :
- Elsevier BV, 2003.
-
Abstract
- We present a study of the influence of H 2 as a carrier gas on the nucleation and growth of silicon quantum dots (Si-QDs) on SiO 2 by CVD. Compared with Si-QDs deposition from pure SiH 4 , the dilution of SiH 4 in H 2 leads to a strong increase of the deposition time without significant modification of the Si-QDs morphology. The effects of doping gas, phosphine and diborane on Si-QDs nucleation and growth are also investigated. We show that the nucleation of Si-QDs is strongly dependent on the SiO 2 substrate surface chemistry. Si–OH groups are identified as nucleation sites for Si-QDs. We study the influence of H 2 carrier gas and doping gases on their impact on Si-QDs nucleation.
Details
- ISSN :
- 09215107
- Volume :
- 101
- Database :
- OpenAIRE
- Journal :
- Materials Science and Engineering: B
- Accession number :
- edsair.doi...........aa8516ceb463f6af5d3758e684686534