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Surface microfabrication of silica glass by excimer laser irradiation of toluene solution
- Source :
- SPIE Proceedings.
- Publication Year :
- 2003
- Publisher :
- SPIE, 2003.
-
Abstract
- Laser-induced backside wet etching of silica glass plates was performed by the excitation of a pure toluene solution with a ns-pulsed KrF excimer laser at 248 nm. Well-defined grid micropattern was fabricated without debris and microcrack around the etched area. To understand the etching mechanism, the formation and propagation of shockwave and bubble were monitored by time-resolved optical microscopy at the interface between the silica glass and the toluene solution after laser irradiation. Transient high-pressure as well as high-temperature generated by UV laser irradiation plays a key role in the etching process.
Details
- ISSN :
- 0277786X
- Database :
- OpenAIRE
- Journal :
- SPIE Proceedings
- Accession number :
- edsair.doi...........aae6b89740bbb37f0d28f8936e93ecb5