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The Influence of Thin Film Microstructure on Surface Acoustic Wave Velocity

Authors :
Michael Geoffrey Somekh
G. M. Crean
J. C. Oberlin
A. Golanski
Source :
IEEE 1987 Ultrasonics Symposium.
Publication Year :
1987
Publisher :
IEEE, 1987.

Abstract

This paper presents experimental surface acoustic wave velocity dispersion data, obtained from thin film tungsten silicide layers (500-2500 A) cosputtered on single-crystal silicon wafers, as a function of various technologically relevant thermal processing treatments. The velocity dispersion data was determined using an acoustic microscope operating at 375 MHz via the acoustic material signature (AMs) technique. Transmission electron microscopy and X-ray diffraction analysis were used to characterise the microstructure of these thin films. Simple mathematical expressions for the transmission of a surface wave along a varying polycrystalline structure were then used to interpret the experimental data, the approximate model thus developed enables us to access the interface conditions between grains in the material.

Details

Database :
OpenAIRE
Journal :
IEEE 1987 Ultrasonics Symposium
Accession number :
edsair.doi...........afb8b559dafc3e1413220cf540e8b379