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Exploiting the dodecane and ozone sensing capabilities of nanostructured tungsten oxide films
- Source :
- Sensors and Actuators B: Chemical. 266:773-783
- Publication Year :
- 2018
- Publisher :
- Elsevier BV, 2018.
-
Abstract
- Tungsten oxide thin films are grown by DC reactive magnetron sputtering combining glancing angle deposition (GLAD) and reactive gas pulsing process (RGPP). Inclined, zigzag and spiral columnar architectures are produced with various oxygen injections during the growth. The dodecane and ozone sensing properties of these tungsten oxide nanostructured active layers are comparatively studied with that of films deposited by conventional sputtering process. Microstructure, morphologies and electrical behaviors are characterized as a function of the growing conditions. As-deposited films systematically exhibit an amorphous crystal structure with a porous microstructure, which depends on the GLAD architecture. Annealing at 300 °C in air for 12 h leads to a polycrystalline structure keeping voided networks. Dodecane and ozone sensing performances are the most significant for inclined columnar architectures but they also depend on the RGPP sputtering conditions. As a result, the GLAD + RGPP combination proves to be a relevant strategy for the fabricating tungsten oxide nanostructured films as active layers with an attractive potential for gas sensors.
- Subjects :
- Ozone
Materials science
Annealing (metallurgy)
Dodecane
Metals and Alloys
02 engineering and technology
010402 general chemistry
021001 nanoscience & nanotechnology
Condensed Matter Physics
Microstructure
01 natural sciences
0104 chemical sciences
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Amorphous solid
chemistry.chemical_compound
chemistry
Chemical engineering
Sputtering
Materials Chemistry
Crystallite
Electrical and Electronic Engineering
Thin film
0210 nano-technology
Instrumentation
Subjects
Details
- ISSN :
- 09254005
- Volume :
- 266
- Database :
- OpenAIRE
- Journal :
- Sensors and Actuators B: Chemical
- Accession number :
- edsair.doi...........afe4b019d468f5ed8862b49624e9fe67