Surface smoothing of poly(methyl methacrylate) film by laser induced photochemical etching

The surface of poly(methyl methacrylate) (PMMA) film was etched by laser irradiation under O2 and vacuum conditions. By activating the O2 molecules near the rough surface, oxygen radicals will preferably etch the protrusions on the PMMA surface. Three lasers of different wavelengths were used for comparison. Laser irradiation at a short wavelength such as 325 nm resulted in high etch rates whereas a long wavelength such as 532 nm resulted in no effect on the surface profile. The PMMA surface was not etched under the vacuum condition, indicating the necessity of O2 molecules in etching.