Back to Search Start Over

Study on wet etching of dummy polysilicon in narrow pattern gap using alkaline solution

Authors :
Dongjoo Shin
Kwangsu Kim
Youngki Ahn
Taesung Kim
Source :
Materials Science in Semiconductor Processing. 143:106561
Publication Year :
2022
Publisher :
Elsevier BV, 2022.

Details

ISSN :
13698001
Volume :
143
Database :
OpenAIRE
Journal :
Materials Science in Semiconductor Processing
Accession number :
edsair.doi...........b05924fbc2de9a7b4a6c81e83de4527c
Full Text :
https://doi.org/10.1016/j.mssp.2022.106561