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Study on wet etching of dummy polysilicon in narrow pattern gap using alkaline solution
- Source :
- Materials Science in Semiconductor Processing. 143:106561
- Publication Year :
- 2022
- Publisher :
- Elsevier BV, 2022.
Details
- ISSN :
- 13698001
- Volume :
- 143
- Database :
- OpenAIRE
- Journal :
- Materials Science in Semiconductor Processing
- Accession number :
- edsair.doi...........b05924fbc2de9a7b4a6c81e83de4527c
- Full Text :
- https://doi.org/10.1016/j.mssp.2022.106561