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Activation energies for Te and Be in metamorphically grown AlSb and InxAl1−xSb layers

Authors :
Philip Dowd
P. Hill
Sanjay Krishna
L. R. Dawson
N. R. Weisse-Bernstein
Source :
Applied Physics Letters. 87:092105
Publication Year :
2005
Publisher :
AIP Publishing, 2005.

Abstract

The activation energies of tellurium and beryllium in InxAl1−xSb grown by solid-source molecular beam epitaxy on semi-insulating GaAs substrates are reported. Temperature-dependent Hall measurements of carrier concentration show that while the activation energy of beryllium is relatively low for all compositions (EA 100meV) in the composition range between approximately 0.1

Details

ISSN :
10773118 and 00036951
Volume :
87
Database :
OpenAIRE
Journal :
Applied Physics Letters
Accession number :
edsair.doi...........b10d8a7dc6ea8961f20362331d60003f
Full Text :
https://doi.org/10.1063/1.2032591