Effect of Ti doping on microstructure of SiO2-CTAB mesoporous films

nSiO2-TiO2-CTAB (n is the molar ratio of Si to Ti, n = 2, 10, 20, 40, 60, 80) composite films were synthesized by sol-gel process of titanium isopropoxide (TPOT) and tetraethyl orthosilicate (TEOS) hydrolyzation using surfactant cetyltrimethyl ammonium bromide (CTAB) as the template. The microstructure of the films was investigated by Transmission electron microscopy (TEM), atomic force microscope (AFM), X-ray diffractometer (XRD) and UV- infrared spectrophotometer. The results show that Ti ions homogeneously disperse in the mesoporous SiO2 matrix forming Si-O-Ti bonding when n is greater than 20, and Ti ions disrupt the uniformity of the pores in the composite mesoporous films and reduce the structural order when n is lesser than 10. SiO2 and TiO2 of SiO2-TiO2-CTAB mesoporous films is amorphous calcined at 450°C, 600°C, 700°C, 800°C.