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UV nanoimprint lithography with rigid polymer molds

Authors :
Dirk Mayer
Michael Prömpers
A. v. d. Hart
Sandra Gilles
Carsten Kügeler
Andreas Offenhäusser
Matthias Meier
Source :
Microelectronic Engineering. 86:661-664
Publication Year :
2009
Publisher :
Elsevier BV, 2009.

Abstract

Transparent polymers are considered as alternative low-cost mold materials in UV nanoimprint lithography (UV-NIL). Here, we demonstrate a nanoimprint process with molds made of rigid polymers novel for this application. These polymer molds are found to show high performance in the patterning with UV-NIL. Sub-50nm structures were fabricated with this process.

Details

ISSN :
01679317
Volume :
86
Database :
OpenAIRE
Journal :
Microelectronic Engineering
Accession number :
edsair.doi...........b3f8600fd22020ccea44ae57001b5c6e