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Wideband Substrate Integrated Waveguide Bandpass Filter Based on 3-D ICs
- Source :
- IEEE Transactions on Components, Packaging and Manufacturing Technology. 9:728-735
- Publication Year :
- 2019
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 2019.
-
Abstract
- This paper proposes a substrate integrated waveguide bandpass filter (SIW BPF), exploiting the through-dielectric via (TDV)-based 3-D integrated circuit (3-D IC) technology. The SIW BPF is designed on the dielectric cavity that is etched on the traditional low-resistivity silicon (LRSi) in a 3-D IC system, acting as the insulating material between through-silicon via plugs and LRSi. This construction can reduce prominent eddy current losses in LRSi and coupling losses among TDV plugs for the millimeter-wave application. Benzocyclobutene and glass are chosen as the dielectric cavity due to the low dielectric constant and loss tangent. The detailed design procedure beginning from the normalized Chebyshev low-pass filter to the final optimized SIW BPF is presented. The filter having a 12.5% fractional bandwidth is centered at 159.67 GHz. The return losses and insertion loss across the passband are about −10 and −1.5 dB, respectively. Numerical analysis of the advanced design system and full-wave simulation results of Ansoft’s HFSS show a good agreement.
- Subjects :
- Waveguide (electromagnetism)
Materials science
business.industry
HFSS
Low-pass filter
020206 networking & telecommunications
02 engineering and technology
021001 nanoscience & nanotechnology
Chebyshev filter
Industrial and Manufacturing Engineering
Electronic, Optical and Magnetic Materials
Band-pass filter
Filter (video)
0202 electrical engineering, electronic engineering, information engineering
Insertion loss
Optoelectronics
Electrical and Electronic Engineering
0210 nano-technology
business
Passband
Subjects
Details
- ISSN :
- 21563985 and 21563950
- Volume :
- 9
- Database :
- OpenAIRE
- Journal :
- IEEE Transactions on Components, Packaging and Manufacturing Technology
- Accession number :
- edsair.doi...........ba16368c60b189aa4733474d4ba83ffe
- Full Text :
- https://doi.org/10.1109/tcpmt.2018.2878863