Structural and Optical Studies on Radio Frequency (Rf) Magnetron Sputter Deposited Nickel Oxide Thin Films

Nickel oxide, an example for metal oxide has its own remarkable impact as anodic coloring material in the field of electrochromic smart window. Radio frequency sputtering technique is implemented in preparing thin film of nickel oxide (NiO) over microscopic glass substrate. The conformational analysis is done by X-ray diffraction technique (XRD) and UV–Vis–NIR spectrophotometer. XRD reveals the crystalline nature of the deposited NiO thin film. A maximum transparency of 92% is obtained for the film deposited at 160 W RF which finds a wide application in optoelectronic devices.