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First Insight Into the Lifetime Acceleration Model of High-$k$$\hbox{ZrO}_{2}/\hbox{SiO}_{2}/\hbox{ZrO}_{2}$ Stacks for Advanced DRAM Technology Nodes

Authors :
Johannes Heitmann
Dayu Zhou
Lars Oberbeck
Elke Erben
R. Agaiby
Uwe Schroeder
P. Hofmann
M. Kerber
Source :
IEEE Electron Device Letters. 30:340-342
Publication Year :
2009
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 2009.

Abstract

Long-term reliability results over six orders of magnitude in time are presented showing that the voltage acceleration model for ZrO2/SiO2/ZrO2 exhibits an exponential dependence with voltage, down to 2 V. The voltage acceleration parameter gamma is between 10 and 15 V-1, depending on the biasing polarity. Soft-breakdown behavior (SILC) is evident prior to the onset of hard breakdown as a result of barrier lowering or charge accumulation in the high- k film. Under ac stress conditions, this SILC branch is lowered in magnitude, translating to a gain in lifetime to breakdown.

Details

ISSN :
15580563 and 07413106
Volume :
30
Database :
OpenAIRE
Journal :
IEEE Electron Device Letters
Accession number :
edsair.doi...........bb2f52652bc6d879f45b185e516da242
Full Text :
https://doi.org/10.1109/led.2009.2012520