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Growth characteristics of chloride-based SiC epitaxial growth
- Source :
- physica status solidi (RRL) - Rapid Research Letters. 2:278-280
- Publication Year :
- 2008
- Publisher :
- Wiley, 2008.
-
Abstract
- In this study some aspects of the chloride-based CVD growth process have been investigated by using both the approach to add HCl to the standard precursors and by using the single molecule precurso ...
Details
- ISSN :
- 18626270 and 18626254
- Volume :
- 2
- Database :
- OpenAIRE
- Journal :
- physica status solidi (RRL) - Rapid Research Letters
- Accession number :
- edsair.doi...........bc4720b4ff6ea75d08fc02ecc8c5cccc
- Full Text :
- https://doi.org/10.1002/pssr.200802183