Study of the Influence of the Thickness of Dielectric Layer in a FED

In our experiments a normal gate FED was fabricated by screen printing method, obtaining the spot size and brightness uniformity on the screen in the vacuum chamber. Then we measured the dielectric layer's thickness. From the measurement results, the fluctuation of the dielectric layer is found. A simulation model is also constructed to analyze the sensitivity of the thickness of the dielectric layer on the brightness uniformity.