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Ru/WNxBilayers as Diffusion Barriers for Cu Interconnects

Authors :
Windu Sari
Tae-Kwang Eom
Sang-Hyeok Choi
Soo-Hyun Kim
Source :
Japanese Journal of Applied Physics. 50:05EA08
Publication Year :
2011
Publisher :
IOP Publishing, 2011.

Subjects

Subjects :
Physics and Astronomy (miscellaneous)
General Engineering
General Physics and Astronomy

Details

ISSN :
13474065 and 00214922
Volume :
50
Database :
OpenAIRE
Journal :
Japanese Journal of Applied Physics
Accession number :
edsair.doi...........c92f4389998b17de4bff9d140178b8c7

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