Structural characterization of ordered SiGe films grown on Ge(100) and Si(100) substrates

MLA

Taichiro Ito, et al. “Structural Characterization of Ordered SiGe Films Grown on Ge(100) and Si(100) Substrates.” Journal of Applied Physics, vol. 80, Oct. 1996, pp. 3804–07. EBSCOhost, https://doi.org/10.1063/1.363333.

APA

Taichiro Ito, A. Sasaki, T. Araki, N. Fujimura, & A. Wakahara. (1996). Structural characterization of ordered SiGe films grown on Ge(100) and Si(100) substrates. Journal of Applied Physics, 80, 3804–3807. https://doi.org/10.1063/1.363333

Chicago

Taichiro Ito, A. Sasaki, T. Araki, N. Fujimura, and A. Wakahara. 1996. “Structural Characterization of Ordered SiGe Films Grown on Ge(100) and Si(100) Substrates.” Journal of Applied Physics 80 (October): 3804–7. doi:10.1063/1.363333.