Thin films of ferrite and ferroelectric materials deposited by pulsed laser vaporization process

Thin films of BaTiO3 and Ni x Fe3−x O4 have been obtained by pulsed ruby laser evaporation process. In the case of BaTiO3 a sintered bulk pellet was used as the vaporization source, while Fe50Ni50 metallic alloy was used as the source for synthesis of nickel ferrite. The dependence of the film properties on oxygen partial pressure and laser energy density during deposition has been investigated. It is shown that thin films of these materials having good structural, morphological and stoichiometric properties can be obtained by the laser process by appropriate control of process parameters.